Ultraintense Tabletop Laser Engineering: Excimer Amplifier Stage

The advent of the Ultraintense Tabletop Laser Systems (UITLSs) has opened new and until then unexpected frontiers allowing the development and the progress of new research areas, in particular in scientific and industrial fields. Usually, these laser systems are used to generate plasma on solid or gaseous targets, so-called Laser Induced Plasma (LIP). The generated plasma behaves like a source of visible, UV and X radiation, that can be used for many applications. In particular, UITLSs are used for radiation−matter interaction studies, fundamental plasma parameter determination, astrophysical applications, inertial confinement fusion, studies in the high energy physics or in the compact particle accelerator field, quantum electrodynamics studies, industrial production processes concerning soldering, targeting, drilling, micromachining, etc. The UITLS designing and realization are very hard jobs that need of interdisciplinary cooperative efforts between researchers of different disciplines: physics, chemistry, engineering, material science, etc. In this paper, is explained an UITLS developing in Tor Vergata University laboratories: UV laser source (248nm / 50fs / 100mJ / max repetition rate = 100Hz) based on a Ti:Sapphire (Ti:Sa) crystal oscillator, CPA+MPA techniques and Excimer End Amplifier that will be treated in its design details and characterized.